AMC Filters
AMC Filters
A special challenge in highly clean production environments (i.e. semiconductor manufacturing) is removal of airborne molecular contamination (AMC), such as acids, bases, condensables and dopants from the process air. These can lead to undesired chemical reactions on the wafer surface and process equipment. Being one of the pioneers in the development of AMC filters, Exentec offers a comprehensive variety of different filtration products for various application areas, such as make-up air (MAU) or return air filters filters for cleanroom ceilings or for tool and process protection.
The products are engineered in our in-house technology center and are qualified and optimized in all relevant aspects such as filter capacity (= max lifetime), highest removal efficiency (= max process protection), lowest pressure drop (= energy saving), lowest outgassing and particle development. This is accompanied by complementary services such as application consulting, on-site measurements, rest capacity analyses, etc.
We look forward helping you finding the right solution for your special requirements!
Cleanroom Ceiling / Tool Filters: ICF/PCF series
Flat filters containing activated or impregnated carbon media.
Cleanroom Ceiling / Tool Filters: INX series
Flat filters containing ion-exchange media for highly effective removal of acids or bases.
Cleanroom Ceiling / Tool Filters: INX / PCF series
Flat combination filters containing different filter media in one housing for removal of multiple contaminant categories.
Cleanroom Ceiling / Tool Filters: R-PCF series
Flat filter containing a special activated carbon medium, which allows regenerating the product, thus enabling several usage cycles.
Makeup and Return Air: CCF series
V-cell with polystyrene frame containing activated or impregnated carbon media.
Makeup and Return Air: CCF series
V-cell with polystyrene frame containing ion-exchange media for highly effective removal of acids or bases.