Many industrial processes require water of a clearly defined quality and purity. This applies to pharmaceutical production processes in particular, but also to many other industries. Using high purity water systems from Exentec, different purity levels can be realised – even "water for injection" of the highest quality. 

The systems can be integrated within the existing infrastructure upon request or operated as a stand-alone solution. In any case they are designed by experienced Exentec specialists in accordance with the applicable industry standards, specifications and regulations. In addition to the integration of generator systems, Exentec also manufactures complete piping and distribution systems including all components and sensor technology, optionally in stainless steel or plastic.  

Together with the customer Exentec develops systems and solutions to generate UPW and condition it with a precision of ± 0,25 mK. Those products are the precondition for the successful application of immersion technology in lithographic processes. 

To generate smaller structures with the same wavelength the optical density of the medium between objective and wafer can be changed using water. As the optical density is extremely sensitive to chemical impurities as well as changes in temperature, the used  Ultra-Pure-Water (UPW) requires an extremely high temperature stability to achieve stable imaging qualities. 


Properties 

• Generation of ultrapure water 
• Controlling particulate contaminants 
• Extremely precise temperature control